2230
Epitaxial Growth of Heavily B-Doped Si and Ge Films on Si(100) by Low-Energy ECR Ar Plasma CVD without Substrate Heating
Epitaxial Growth of Heavily B-Doped Si and Ge Films on Si(100) by Low-Energy ECR Ar Plasma CVD without Substrate Heating
Tuesday, October 29, 2013: 11:40
Continental 7, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Abstract:
- E12-2230 (187.6KB) - Abstract Text