2234
Characterization of Local Strain Structures in Heteroepitaxial Ge1−xSnx/Ge Microstructures by Using Microdiffraction Method

Tuesday, October 29, 2013: 15:20
Continental 7, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Shinichi Ike, Bachelor degree , Nagoya University, Nagoya, Japan
Yoshihiko Moriyama, Master degree , National Institute of Advanced Industrial Science and Technology
Masashi Kurosawa, PhD , Research Fellow of the Japan Society for the Promotion of Science
Noriyuki Taoka, PhD , Nagoya University
Osamu Nakatsuka, PhD , Nagoya University, Nagoya, Japan
Yasuhiko Imai, PhD , Japan Synchrotron Radiation Research Institute/SPring-8
Shigeru Kimura, PhD , Japan Synchrotron Radiation Research Institute/SPring-8
Tsutomu Tezuka, PhD , National Institute of Advanced Industrial Science and Technology
Shigeaki Zaima, PhD , Nagoya University

Abstract:

See more of: Ge-based Technologies
See more of: E12: ULSI Process Integration 8
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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