2007
Low-Dielectric Constant SiCN Charge Trapping Layer for Nonvolatile Memory Applications

Wednesday, October 30, 2013
Grand Ballroom, Tower 2, Grand Ballroom Level (Hilton San Francisco Union Square)
Kiyoteru Kobayashi , Tokai University, Hiratsuka, Japan
Shinji Naito , Tokai University
Shuichi Nakiri , Tokai University
Yoshina Ito , Tokai University

Abstract:

See more of: E5 Poster Session
See more of: E5: Nonvolatile Memories
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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