Nanowire Technology

Monday, October 28, 2013: 14:00-16:40
Union Square 22, Tower 3, 4th Floor (Hilton San Francisco Union Square)
Chairs:
Uri Banin, Ph.D. and Sanjay K Banerjee
14:00
Oxidation Models for Crystalline Silicon Nanowires
Robert George Mertens, Ph.D., University of Central Florida; Victor H. Velez, MS, University of Central Florida; Kalpathy B Sundaram, University of Central Florida
14:20
Resistivity of Ni Silicide Nanowires and Its Dependence on Ni Film Thickness Used for the Formation
Jinhan Song, Tokyo Institute of Technology; Kazuki Matsumoto, Tokyo Institute of Technology; Kuniyuki Kakushima, Tokyo Institute of Technology; Yoshinori Kataoka, Tokyo Institute of Technology; Akira Nishiyama, Tokyo Institute of Technology; Nobuyuki Sugii, Tokyo Institute of Technology; Hitoshi Wakabayashi, Tokyo Institute of Technology; Kazuo Tsutsui, Tokyo Institute of Technology; Kenji Natori, Tokyo Institute of Technology; Hiroshi Iwai, Tokyo Institute of Technology
14:40
(Invited) III-V Nanowires for Optoelectronic Applications
Hoe Tan, PhD, The Australian National University; N. Jiang, The Australian National University; D. Saxena, The Australian National University; Y. H. Lee, The Australian National University; S. Mokkapati, The Australian National University; L. Fu, The Australian National University; Q. Gao, The Australian National University; H. J. Joyce, University of Oxford; Chennupati Jagadish, PhD, The Australian National University
15:10
(Invited) Vertical III-V Nanowire-Channel on Si
Katsuhiro Tomioka, Ph.D, Japan Science and Technology Agency; Takashi Fukui, Prof., Hokkaido University
15:40
(Invited) Nanoscale Heterogeneous Reactions and Interfaces in Ge/Si and for III-V on Si Integrated Devices
Shadi Dayeh, PhD, University of California San Diego; Wei Tang, PhD, University of California Los Angeles; Binh-Minh Nguyen, PhD, University of California San Diego; Xing Dai, MS, Nanyang Technological University; Yang Liu, PhD, Sandia National Laboratories; Yoontae Hwang, PhD, University of California San Diego; X. -H. Liu, Nanyang Technological University; Renjie Chen, MS, University of California San Diego
16:10
(Invited) How to Dope a Semiconductor Nanocrystal
Yorai Amit, The Institute of Chemistry, Hebrew University, Jerusalem 91904, Israel; Adam Fasut, The Center for Nanoscience and Nanotechnology, Hebrew University, Jerusalem 91904, Israel; Oded Milo, PhD, The Center for Nanoscience and Nanotechnology, Hebrew University, Jerusalem 91904, Israel; Eran Rabani, PhD, School of Chemistry, Sackler Faculty of Exact Sciences, Tel Aviv University, Tel Aviv 69978, Israel; Anatoly Frenkel, PhD, The Department of Physics, Yeshiva University, New York, New York 10016, United States; Uri Banin, Ph.D., The Institute of Chemistry, Hebrew University, Jerusalem 91904, Israel