Monday, October 28, 2013: 14:00-16:40
	Union Square 22, Tower 3, 4th Floor (Hilton San Francisco Union Square)
	
	
	
	
	
		
			Chairs:
			
				
					
					
						Uri Banin, Ph.D.
					
				
					 and 
					
						Sanjay K Banerjee
					
				
			
 
		 
	
	
	
	
	
		
			14:20
		
	
	
	
		
			
				Resistivity of Ni Silicide Nanowires and Its Dependence on Ni Film Thickness Used for the Formation
			
			
				
					
						Jinhan Song, Tokyo Institute of Technology; 
					
						Kazuki Matsumoto, Tokyo Institute of Technology; 
					
						Kuniyuki Kakushima, Tokyo Institute of Technology; 
					
						Yoshinori Kataoka, Tokyo Institute of Technology; 
					
						Akira Nishiyama, Tokyo Institute of Technology; 
					
						Nobuyuki Sugii, Tokyo Institute of Technology; 
					
						Hitoshi Wakabayashi, Tokyo Institute of Technology; 
					
						Kazuo Tsutsui, Tokyo Institute of Technology; 
					
						Kenji Natori, Tokyo Institute of Technology; 
					
						Hiroshi Iwai, Tokyo Institute of Technology
					
				
			
			
				
			
		
	 
 
	
	
		
			14:40
		
	
	
	
		
			
				(Invited) III-V Nanowires for Optoelectronic Applications
			
			
				
					
						Hoe Tan, PhD, The Australian National University; 
					
						N. Jiang, The Australian National University; 
					
						D. Saxena, The Australian National University; 
					
						Y. H. Lee, The Australian National University; 
					
						S. Mokkapati, The Australian National University; 
					
						L. Fu, The Australian National University; 
					
						Q. Gao, The Australian National University; 
					
						H. J. Joyce, University of Oxford; 
					
						Chennupati Jagadish, PhD, The Australian National University
					
				
			
			
				
			
		
	 
 
	
	
	
		
			15:40
		
	
	
	
		
			
				(Invited) Nanoscale Heterogeneous Reactions and Interfaces in Ge/Si and for III-V on Si Integrated Devices
			
			
				
					
						Shadi Dayeh, PhD, University of California San Diego; 
					
						Wei Tang, PhD, University of California Los Angeles; 
					
						Binh-Minh Nguyen, PhD, University of California San Diego; 
					
						Xing Dai, MS, Nanyang Technological University; 
					
						Yang Liu, PhD, Sandia National Laboratories; 
					
						Yoontae Hwang, PhD, University of California San Diego; 
					
						X. -H. Liu, Nanyang Technological University; 
					
						Renjie Chen, MS, University of California San Diego
					
				
			
			
				
			
		
	 
 
	
	
		
			16:10
		
	
	
	
		
			
				(Invited) How to Dope a Semiconductor Nanocrystal
			
			
				
					
						Yorai Amit, The Institute of Chemistry, Hebrew University, Jerusalem 91904, Israel; 
					
						Adam Fasut, The Center for Nanoscience and Nanotechnology, Hebrew University, Jerusalem 91904, Israel; 
					
						Oded Milo, PhD, The Center for Nanoscience and Nanotechnology, Hebrew University, Jerusalem 91904, Israel; 
					
						Eran Rabani, PhD, School of Chemistry, Sackler Faculty of Exact Sciences, Tel Aviv University, Tel Aviv 69978, Israel; 
					
						Anatoly Frenkel, PhD, The Department of Physics, Yeshiva University, New York, New York 10016, United States; 
					
						Uri Banin, Ph.D., The Institute of Chemistry, Hebrew University, Jerusalem 91904, Israel