2148
Resistivity of Ni Silicide Nanowires and Its Dependence on Ni Film Thickness Used for the Formation
Resistivity of Ni Silicide Nanowires and Its Dependence on Ni Film Thickness Used for the Formation
Monday, October 28, 2013: 14:20
Union Square 22, Tower 3, 4th Floor (Hilton San Francisco Union Square)
Abstract:
- E10-2148 (239.7KB) - Abstract Text