224th ECS Meeting (October 27 – November 1, 2013)

October 27 - November 01, 2013

ALD-TiO₂ Preparation and Characterization for Metal-Insulator-Silicon Photoelectrochemical Applications
Andrew G. Scheuermann, Materials Science and Engineering, Stanford University, Stanford, CA, United States; John P. Lawrence, Materials Science and Engineering, Stanford University, Stanford, CA, United States; Marika Gunji, Materials Science and Engineering, Stanford University, Stanford, CA, United States; Christopher E.D. Chidsey, Chemistry, Stanford University, Stanford, CA, United States.; Paul C. McIntyre, Materials Science and Engineering, Stanford University, Stanford, CA, United States

(Invited) Characteristics of SnS_x by Atomic Layer Deposition for CIGS Solar Cells
Giyul Ham, Division of Materials Science and Engineering, Hanyang University; Seokyoon Shin, Division of Materials Science and Engineering, Hanyang University; Joohyun Park, Department of Nanoscale Semiconductor Engineering, Hanyang University; Hyeongtag Jeon, Division of Materials Science and Engineering, Hanyang University

(Invited) Atomic Layer Deposition of Multicomponent Metal Sulfides Applied to Thin Film Photovoltaics
Elijah Thimsen, University of Minnesota

Intermission

(Invited) Spatial Atomic Layer Deposition of Transparent Conductive Oxides
A. Illiberi, TNO Thin Films Technology Department and Holst Centre; R. Scherpenborg, TNO Thin Films Technology Department and Holst Centre; P. Poodt, TNO Thin Films Technology Department and Holst Centre; F. Roozeboom, Eindhoven University of Technology

Characteristics of Thin Film Yttria-Stabilized Zirconia Electrolyte by Atomic Layer Deposition for Thin Film Solid Oxide Fuel Cells (Cancelled)

(Invited) Conformal Deposition for 3D Thin-Film Batteries
Philippe M. Vereecken, imec, Belgium; Cedric Huyghebaert, PhD, imec

High Surface Capacity Li-Ion All Solid State 3D Microbattery Based on Anatase TiO₂ Deposited by ALD on Silicon Microstructures
Etienne Eustache, IMN JR CNRS UMR 6502 – Université de Nantes (Fr); Pascal Tilmant, IEMN CNRS UMR 8520 – Université Lille 1 (Fr); Laurence Morgenroth, IEMN CNRS UMR 8520 – Université Lille 1 (Fr); Pascal Roussel, UCCS; Nathalie Rolland, IEMN UMR CNRS 8520; Thierry Brousse, Institut des Matériaux Jean Rouxel (IMN) - CNRS/University of Nantes; Christophe Lethien, IEMN CNRS UMR 8520 – Université Lille 1 (Fr)