E2 Atomic Layer Deposition Applications 9

Lead Organizer: F. Roozeboom (Eindhoven University of Technology)

Co-organizers: Stefan De Gendt (IMEC) , Annelies Delabie (imec) , Jeffrey W. Elam (Argonne National Laboratory) , A. Londergan (Qualcomm Technologies, Inc.) and O. van der Straten (IBM Research)

Wednesday, October 30, 2013

Wednesday | Thursday | Friday | top

14:10-15:40


General Session
Continental 8, Tower 3, Ballroom Level
Chair(s): F. Roozeboom and A. Londergan

15:40-17:40


Reaction Mechanisms & Characterization
Continental 8, Tower 3, Ballroom Level
Chair(s): A. Londergan and A. Mackus

18:00-20:00


Poster Session
Grand Ballroom, Tower 2, Grand Ballroom Level
Chair(s): S. De Gendt and O. van der Straten

Thursday, October 31, 2013

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08:00-12:00


Energy Applications
Continental 8, Tower 3, Ballroom Level
Chair(s): J. W. Elam and G. M. Sundaram

14:00-18:00


Oxides and Conductors for Advanced Devices
Continental 8, Tower 3, Ballroom Level
Chair(s): O. van der Straten, C. S. Hwang, J. W. Elam and M. Popovici

Friday, November 1, 2013

Wednesday | Thursday | Friday | top

08:00-10:00


Materials Diversification
Continental 8, Tower 3, Ballroom Level
Chair(s): F. Roozeboom and Stefan De Gendt

10:00-12:05


III-V and Silicon MOS
Continental 8, Tower 3, Ballroom Level
Chair(s): A. Londergan and O. van der Straten