Wednesday, October 30, 2013: 18:00-20:00
Grand Ballroom, Tower 2, Grand Ballroom Level (Hilton San Francisco Union Square)
Chairs:
S. De Gendt
and
O. van der Straten
Diaphragm Durability Enhancement for Valves Supplying Gas for Atomic Layer Deposition
Michio Yamaji, Tohoku University;
Tsuyoshi Tanikawa, Fujikin Incorporated;
Tadayuki Yakushijin, Fujikin Incorporated;
Takashi Funakoshi, Fujikin Incorporated;
Satoru Yamashita, Fujikin Incorporated;
Atsushi Hidaka, Fujikin Incorporated;
Masaaki Nagase, Fujikin Incorporated;
Nobukazu Ikeda, Fujikin Incorporated;
Shigetoshi Sugawa, Ph. D., Tohoku University;
Tadahiro Ohmi, Ph. D., Tohoku University
VO2 Films Prepared by Atomic Layer Deposition and RF Magnetron Sputtering
Madhavi Tangirala, Newport News;
Kai Zhang, Newport News;
David Nminibapiel, Newport News;
Venkateswara Pallem, Delaware Research & Technology Center;
Christian Dussarrat, Delaware Research & Technology Center;
Wei Cao, Newport News;
Thomas N Adam, PhD, University at Albany;
Corbet S Johnson, B.Sc., University at Albany;
Hani Elsayed-Ali, Newport News;
Helmut Baumgart, Newport News
Microstructure Analysis of ALD Bi2Te3/Sb2Te3 Thermoelectric Nanolaminates
David Nminibapiel, Applied Research Center at Thomas Jefferson National Accelerator Laboratories;
Kai Zhang, Applied Research Center at Thomas Jefferson National Accelerator Laboratories;
Madhavi Tangirala, Applied Research Center at Thomas Jefferson National Accelerator Laboratories;
Helmut Baumgart, Applied Research Center at Thomas Jefferson National Accelerator Laboratories;
Venkata S Chakravadhanula, Karlsruhe Institute of Technology;
Christian Kübel, Karlsruhe Institute of Technology;
Vladimir Kochergin, MicroXact Inc.
