Reaction Mechanisms & Characterization

Wednesday, October 30, 2013: 15:40-17:40
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
A. Londergan and A. Mackus
(Invited) Unit Steps of an ALD Half-Cycle
Tom Blomberg, ASM Microchemistry Ltd.
(Invited) In Situ Characterization of Plasma-Assisted Pt ALD on W ALD Adhesion Layers with Spectroscopic Ellipsometry
Andrew S. Cavanagh, University of Colorado; Layton Baker, University of Colorado; Joel W. Clancey, University of Colorado; Jun Yin, University of Colorado; Anusorn Kongkanand, General Motors Research and Development; Fredrick T. Wagner, General Motors Research and Development; Steven M. George, University of Colorado
(Invited) Vapor Phase Surface Functionalization Using Atomic Layer Deposition (ALD) and Self Assembled Molecules (SAMs)
Ganesh M. Sundaram, Ultratech-Cambridge NanoTech; Laurent Lecordier, Ultratech-Cambridge NanoTech; R. Bhatia, Ultratech-Cambridge NanoTech