Reaction Mechanisms & Characterization

Wednesday, October 30, 2013: 15:40-17:40
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Chairs:
A. Londergan and A. Mackus
15:40
1859
(Invited) Unit Steps of an ALD Half-Cycle
Tom Blomberg, ASM Microchemistry Ltd.
16:20
1860
(Invited) In Situ Characterization of Plasma-Assisted Pt ALD on W ALD Adhesion Layers with Spectroscopic Ellipsometry
Andrew S. Cavanagh, University of Colorado; Layton Baker, University of Colorado; Joel W. Clancey, University of Colorado; Jun Yin, University of Colorado; Anusorn Kongkanand, General Motors Research and Development; Fredrick T. Wagner, General Motors Research and Development; Steven M. George, University of Colorado
17:00
1861
(Invited) Vapor Phase Surface Functionalization Using Atomic Layer Deposition (ALD) and Self Assembled Molecules (SAMs)
Ganesh M. Sundaram, Ultratech-Cambridge NanoTech; Laurent Lecordier, Ultratech-Cambridge NanoTech; R. Bhatia, Ultratech-Cambridge NanoTech
See more of: E2: Atomic Layer Deposition Applications 9
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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