1860
(Invited) In Situ Characterization of Plasma-Assisted Pt ALD on W ALD Adhesion Layers with Spectroscopic Ellipsometry

Wednesday, October 30, 2013: 16:20
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Andrew S. Cavanagh , UCB 215, University of Colorado, Boulder, CO
Layton Baker , University of Colorado
Joel W. Clancey , University of Colorado
Jun Yin , University of Colorado
Anusorn Kongkanand , General Motors Research and Development
Fredrick T. Wagner , General Motors Research and Development
Steven M. George , UCB 215, University of Colorado, Boulder, CO

Abstract:

See more of: Reaction Mechanisms & Characterization
See more of: E2: Atomic Layer Deposition Applications 9
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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