Oxides and Conductors for Advanced Devices

van der Straten, O.

Oxides and Conductors for Advanced Devices

Thursday, October 31, 2013: 14:00-18:00

Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)

Chairs:

O. van der Straten , C. S. Hwang , J. W. Elam and M. Popovici

14:00

1876

(Invited) Advanced Dielectrics Targeting 2X DRAM MIM Capacitors
Mihaela Popovici, imec; Johan Swerts, imec; Marc Aoulaiche, imec; Augusto Redolfi, imec; Ben Kaczer, imec; Min-Soo Kim, imec; Bastien Douhard, imec; Annelies Delabie, imec; Sergiu Clima, imec; Malgorzata Jurczak, imec; S. Van Elshocht, imec

14:40

1877

ALD of SrTiO₃ and Pt for Pt/SrTiO₃/Pt MIM Structures: Growth and Crystallization Study
Valentino Longo, Eindhoven University of Technology; F. Roozeboom, Eindhoven University of Technology; W.M.M. Kessels, Eindhoven University of Technology; Marcel Verheijen, Eindhoven University of Technology

15:00

1878

Atomic Layer Deposition of Thin Oxide Films for Resistive Switching
Karol Fröhlich Sr., Institute of Electrical Engineering, SAS; Peter Jančovič, Institute of Electrical Engineering, SAS; Boris Hudec, Institute of Electrical Engineering, SAS; Jan Dérer, Institute of Electrical Engineering, SAS; Albena Paskaleva, Instiute of Solid State Physics, BAS; Thomas Bertaud, IHP GmbH; Thomas Schroeder, BTU, Konrad Zuse Strasse 1, 03046 Cottbus, Germany

15:20

Intermission

1879

(Invited) ALD and Pulsed-CVD of Ru, RuO₂, and SrRuO₃ (Cancelled)

16:20

1880

(Invited) Catalytic Surface Reactions during Nucleation and Growth of Atomic Layer Deposition of Noble Metals: A Case Study for Platinum
Adrie Mackus, Eindhoven University of Technology; Ageeth Bol, Eindhoven University of Technology; W. M. M. Kessels, Eindhoven University of Technology

17:00

1881

Conductivity Improvements of Atomic Layer Deposited Ta₃N₅
Hendrik F.W. Dekkers, imec; Lucas Petersen Barbosa Lima, University of Campinas; S. Van Elshocht, imec

17:20

1882

Room Temperature Sensing of O₂ and CO by Atomic Layer Deposition Prepared ZnO Films Coated with Pt Nanoparticles
Ivo Erkens, Holst centre/IMEC; Michiel Blauw, Holst centre/IMEC; Marcel Verheijen, Eindhoven University of Technology; F. Roozeboom, Eindhoven University of Technology; W. M. M. Kessels, Eindhoven University of Technology

1883

X-ray Characterization of PEALD versus PVD Tantalum Nitride Barrier Deposition and the Impact on Via Contact Resistance (Cancelled)

See more of: E2: Atomic Layer Deposition Applications 9
See more of: Dielectric and Semiconductor Materials, Devices, and Processing

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