1881
Conductivity Improvements of Atomic Layer Deposited Ta3N5

Thursday, October 31, 2013: 17:00
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Hendrik F.W. Dekkers , imec, Leuven, Belgium
Lucas Petersen Barbosa Lima , University of Campinas
S. Van Elshocht , imec

Abstract:

See more of: Oxides and Conductors for Advanced Devices
See more of: E2: Atomic Layer Deposition Applications 9
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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