1878
Atomic Layer Deposition of Thin Oxide Films for Resistive Switching

Thursday, October 31, 2013: 15:00
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Karol Fröhlich Sr. , Institute of Electrical Engineering, SAS, Bratislava, Slovakia
Peter Jančovič , Institute of Electrical Engineering, SAS
Boris Hudec , Institute of Electrical Engineering, SAS
Jan Dérer , Institute of Electrical Engineering, SAS
Albena Paskaleva , Instiute of Solid State Physics, BAS
Thomas Bertaud , IHP GmbH
Thomas Schroeder , BTU, Konrad Zuse Strasse 1, 03046 Cottbus, Germany

Abstract:

  • E2-1878 (105.9KB) - Abstract Text
See more of: Oxides and Conductors for Advanced Devices
See more of: E2: Atomic Layer Deposition Applications 9
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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