D2 Electroless Deposition: Principles and Applications 3 - Part III Poster Session

Tuesday, May 13, 2014: 18:00-20:00
Grand Foyer, Lobby Level (Hilton Orlando Bonnet Creek)
Chairs:
Stojan S. Djokic , Nikolay Dimitrov , John Lewellen Stickney and Luca Magagnin
531
Direct Cu Electrodeposition on the Ni Alloy Barrier Layer Prepared By Electroless Deposition on SiO2
K. H. Kim, T. Lim, K. J. Park, M. J. Kim, S. Choe, and J. J. Kim (Seoul National University)
532
Controlled Fabrication of Pt Nanocauliflowers on PEDOT Support and Their Superior Electrocatalytic Activity of Methanol Oxidation Reaction
K. Suganya, S. Arulmani, G. Balagi (CSIR-Central Electrochemical Research Institute), and C. Sivakumar (CSIR-Central Electrochemical Research Institute, Karaikudi, Tamil Nadu, India)
533
Optical Properties of Cobalt Films Electrochemically Deposited from Aqueous and Non-Aqueous Ionic Liquids
T. Dushatinski, C. Huff, and T. M. Abdel-Fattah (Christopher Newport University)
See more of: D2: Electroless Plating: Principles and Applications 3
See more of: Electrochemical/Electroless Deposition
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