225th ECS Meeting (May 11-15, 2014)

May 11 - 15, 2014

A. K. Evseev, M. M. Goldin, A. A. Stepanov, A. V. Pinchuk (N.V. Sklifosovsky Research Institute for Emergency Medicine, Russia), A. D. Davydov (A.N. Frumkin Institute of Physical Chemistry and Electrochemistry RAS, Russia), M. Mirzaeian (School of Engineering, University of the West of Scotland, UK), and M. M. Goldin (Department of Biology and Chemistry, Liberty University, USA)

W. Jiang, S. Hao, Y. Zhang (Key Laboratory of the Ministry of Education for Modern Metallurgy Technology, School of Metallurgy and Energy, Hebei United University), and Y. Ling (Tsinghua University)

S. K. Selvaraj, S. Chang (Department of Chemical Engineering, University of Illinois at Chicago), and C. G. Takoudis (Department of Bioengineering, University of Illinois at Chicago, Department of Chemical Engineering, University of Illinois at Chicago)

H. Ahn, B. Jung (Korea Institute of Construction Technology), D. G. Jang (University of Science and Technology), H. Park (Auburn University), J. C. Joo (Korea Institute of Construction Technology), and D. J. Kim (Auburn University)

M. Sullivan, C. Spradlin, P. K. Q. Nguyen, and S. K. Lunsford (Wright State University)

K. R. Bandi, A. K. Singh, and A. Upadhyay (INDIAN INSTITUTE OF TECHNOLOGY ROORKEE)

D. S. Rajawat (Department of Chemistry, The IIS University, Jaipur) and S. P. Satsangee (USIC, Dayalbagh Educational Institute, Agra)

A. Upadhyay, A. K. Singh, K. R. Bandi (INDIAN INSTITUTE OF TECHNOLOGY ROORKEE), and A. K. Jain (IIT Roorkee)

A. K. Singh (INDIAN INSTITUTE OF TECHNOLOGY ROORKEE), P. Singh (IITRoorkee), and A. Upadhyay (INDIAN INSTITUTE OF TECHNOLOGY ROORKEE)

H. E. Cavalcanti, D. Lima, C. A. Pessoa, and A. G. Viana (Universidade Estadual de Ponta Grossa)

M. Honda (NMEMS Technology Research Organization), T. Itoh, and R. Maeda (National Institute of Advanced Industrial Science and Technology)

S. Cheng, K. Hotani (Graduate School of Advanced Science and Engineering, Waseda University), S. Hideshima, S. Kuroiwa, T. Nakanishi, Y. Mori (Institute for Nanoscience & Nanotechnology, Waseda University), and T. Osaka (Faculty of Science and Engineering, Waseda University)

S. Lee (seoul national university) and Y. Piao (Graduate School of Convergence Science and Technology)

C. S. Santos, V. Pawlak, S. T. Fujiwara, and C. A. Pessoa (Universidade Estadual de Ponta Grossa)

S. Kasai, Y. Suzuki, R. Ishii, M. Tada, Z. Kato, Y. Maruo, and M. Kobayashi (Graduate School of Engineering,Tohoku institute of technology)

Y. Song, V. Penmatsa, J. H. Yang, and C. Wang (Florida International University)

B. P. Crulhas and V. A. Pedrosa (Sao Paulo State University)

K. Tran, G. Borchardt, P. Calvo-Marzal, and K. Y. Chumbimuni-Torres (University of Central Florida)

S. Saraf (Advanced Materials Processing and Analysis Center, University of Central Florida), C. J. Neal (University of Central Florida, Advanced Materials Processing and Analysis Center), A. Kumar (University of Central Florida, Advanced Materials Processing Analysis Center), S. Das (NanoScience Technology Center), S. Park (University of Central Florida, Materials Science and Engineering), S. Seal (NanoScience Technology Center), and H. J. Cho (University of Central Florida, University of Central Florida)

H. Papa and J. Chatterjee (Florida State University)

I. Feliciano (University of Puerto Rico at Rio Piedras), L. Arroyo (University of Pennsylvania), L. Cunci, D. C. Diaz, and C. R. Cabrera (University of Puerto Rico at Rio Piedras)