N3 More-Than-Moore Poster Session
Tuesday, May 13, 2014: 18:00-20:00
Grand Foyer, Lobby Level (Hilton Orlando Bonnet Creek)
Effect of Using Ethanol as the Oxygen Source on the Growth and Dielectric Behavior of Atomic Layer Deposited Hafnium Oxide
S. K. Selvaraj (Department of Chemical Engineering, University of Illinois at Chicago), A. Colon (Department of Electrical and Computer Engineering, University of Illinois at Chicago), J. I. Rossero (Department of Chemical Engineering, University of Illinois at Chicago), J. Shi (Department of Electrical and Computer Engineering, University of Illinois at Chicago), and C. G. Takoudis (Department of Bioengineering, University of Illinois at Chicago, Department of Chemical Engineering, University of Illinois at Chicago)
