CMP Integration and Control
Tuesday, May 13, 2014: 14:00-15:20
Bonnet Creek Ballroom VII, Lobby Level (Hilton Orlando Bonnet Creek)
14:20
Effect of La Doping of Ceria Abrasives for STI CMP
B. V. S. Praveen (Department of Chemical Engineering, Indian Institute of Technology Madras), J. G. Park (Department of Materials Engineering, Hanyang University, Department of Bio nano Technology, Hanyang University), and S. Ramanathan (Department of Chemical Engineering, Indian Institute of Technology Madras)
14:40
ALD W Metal Gate CMP
T. Yang, Q. Xu, Y. Lu (Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing, China), Z. Yue (Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences), J. Xu, G. Wang (Institute of Microelectronics of Chinese Academy of Sciences), H. Cui (Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing, China), J. Li, J. Yan, and C. Zhao (Institute of Microelectronics of Chinese Academy of Sciences)
