P1 Chemical Mechanical Polishing 13

Lead Organizer: R. Rhoades (Entrepix, Inc.)

Co-organizers: Iqbal Ali (SEMATECH) , Gautam Banerjee (Air Products and Chemicals) , L. Economikos (IBM) , D. Huang (Praxair) , Yaw S. Obeng (NIST) and G. Bahar Basim (Ozyegin University)

Tuesday, May 13, 2014

Tuesday | top

08:20-09:30


CMP of Metals
Bonnet Creek Ballroom VII, Lobby Level
Chair(s): Yaw S. Obeng

10:00-11:40


CMP of Dielectrics
Bonnet Creek Ballroom VII, Lobby Level
Chair(s): Iqbal Ali

14:00-15:20


CMP Integration and Control
Bonnet Creek Ballroom VII, Lobby Level
Chair(s): Gautam Banerjee

15:40-16:50


Current Topics in CMP
Bonnet Creek Ballroom VII, Lobby Level
Chair(s): G. Bahar Basim

18:00-20:00


P1 CMP Poster Session
Grand Foyer, Lobby Level