Current Topics in CMP

Tuesday, May 13, 2014: 15:40-16:50
Bonnet Creek Ballroom VII, Lobby Level (Hilton Orlando Bonnet Creek)
G. Bahar Basim
Application of Fluorescence Correlation Spectroscopy in the Characterization of Particle Size Distributions of Colloidal Silica Abrasives Used in Chemical-Mechanical Planarization
L. M. Jacobson (Bradley University, Bradley University), D. K. Turner (Bradley University), A. K. Rawat, C. T. Carver, A. Tripahi, M. Moinpour (Intel Corporation), and E. E. Remsen (Bradley University)
Concluding Remarks
Development of Silicon Polish on 450mm CMP Tool (Cancelled)