Oxide TFT Processes II

Tuesday, 7 October 2014: 14:00-15:00
Expo Center, 1st Floor, Universal 4 (Moon Palace Resort)
Shunpei Yamazaki
The Role of Passivation Layer during Thermal  Annealing for Oxide Semiconductor Thin Films
C. S. Hwang (ETRI), S. H. K. Park (KAIST), S. H. Cho, M. K. Ryu, H. Oh, S. J. Lee, J. H. Yang, C. Byun, J. Park, K. I. Cho (ETRI), and H. Y. Chu (Electronics and Telecommunications Research Institute (ETRI))
Flash Lamp Annealing Effect on Stability of Oxide TFT
S. J. Moon (Department of Display Engineering, Hoseo University), K. M. Yu, S. H. Jeong, J. Y. Kim (Hoseo University), B. K. Kim, H. J. Kim (ViatronTechnologies), E. J. Yun, and B. S. Bae (Hoseo University)