Oxide TFT Processes II

Tuesday, 7 October 2014: 14:00-15:00
Expo Center, 1st Floor, Universal 4 (Moon Palace Resort)
Chair:
Shunpei Yamazaki
14:00
1918
The Role of Passivation Layer during Thermal  Annealing for Oxide Semiconductor Thin Films
C. S. Hwang (ETRI), S. H. K. Park (KAIST), S. H. Cho, M. K. Ryu, H. Oh, S. J. Lee, J. H. Yang, C. Byun, J. Park, K. I. Cho (ETRI), and H. Y. Chu (Electronics and Telecommunications Research Institute (ETRI))
14:20
1919
Flash Lamp Annealing Effect on Stability of Oxide TFT
S. J. Moon (Department of Display Engineering, Hoseo University), K. M. Yu, S. H. Jeong, J. Y. Kim (Hoseo University), B. K. Kim, H. J. Kim (ViatronTechnologies), E. J. Yun, and B. S. Bae (Hoseo University)
14:40
1920
Effect of Negative Oxygen Ions on a-IGZO Thin Films by Superimposed RF/DC Magnetron Sputtering
D. Kim, J. Jang, S. Yoon, and M. Hong (Korea University)
See more of: Q10: Thin Film Transistors 12 (TFT 12)
See more of: Electronic and Photonic Devices and Systems
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