Plenary Session

Tuesday, October 13, 2015: 08:00-10:20
Russell A (Hyatt Regency)
Chairs:
Stanko Brankovic and John Lewellen Stickney
08:00
Welcoming Remarks
08:45
888
(Invited) Thermodynamics of Deposition Flux Dependent Intrinsic Film Stress
M. J. Rost (Kamerlingh Onnes Laboratory - Leiden University)
09:25
889
(Invited) Self-Terminated Electrodeposition Reactions
S. H. Ahn (NIST), Y. Liu (Argonne National Laboratory), R. Wang (National Institute of Standards and Technology), D. Gokcen (NIST), C. M. Hangarter (Excet, Inc.), U. Bertocci (National Institute of Standards and Technology), and T. P. Moffat (National Institute of Standards and Technology)
10:05
Break