Emerging CMP Technologies

Thursday, 2 June 2016: 13:30-16:20
Sapphire 411 B (Hilton San Diego Bayfront)
Chair:
Yaw S. Obeng
13:30
(Invited) Critical Review of CMP Requirements in the Future
G. Banerjee (Air Products and Chemicals Inc)
14:10
Surface Characterization Driven CMP Optimization for Gallium Nitride
A. Karagoz (Ozyegin University), M. Siebert, P. Leunissen (BASF SE), and G. B. Basim (Ozyegin University)
14:30
Afternoon break
14:50
Nano-Sized Chemical Release Capsules Enable High Planarization Efficiency CMP Processes
R. Ihnfeldt, K. Javery, K. Nguyen, and M. Nguyen (General Engineering & Research, L.L.C.)
15:10
Study on the Polishing Performance of Silicon Carbonitride (SiCN)
L. Qin, S. Gu, H. J. Kim, J. H. Han (GLOBALFOUNDRIES Inc.), and D. R. Koli (GLOBALFOUNDRIES Inc)
15:50
16:10
Concluding Remarks