D02 Chemical Mechanical Polishing 14

Lead Organizer: R. Rhoades (Entrepix, Inc.)

Co-organizers: Gautam Banerjee (Air Products and Chemicals Inc.) , G. Bahar Basim (Ozyegin University) , D. Huang (Praxair) , Yaw S. Obeng (NIST) and V. Chaitanya (New Mexico State University)

Wednesday, 1 June 2016

08:30-11:40


CMP Applications and Integration
Sapphire 411 B
Chair(s): Gautam Banerjee

13:10-16:00


CMP Control Systems
Sapphire 411 B
Chair(s): G. Bahar Basim

18:00-20:00


D02 Poster Session
Exhibit Hall H

Thursday, 2 June 2016

08:30-13:30


CMP Fundamentals
Sapphire 411 B
Chair(s): V. Chaitanya

13:30-16:20


Emerging CMP Technologies
Sapphire 411 B
Chair(s): Yaw S. Obeng