H. Zhou, K. Murella, J. Hughes, and M. O'Neill (Air Products & Chemicals)

M. G. Theivanayagam, H. Wang, J. Cohen, M. VanHanehem, T. Sabo, and S. DeNardi (Dow Electronic Materials, The Dow Chemical Company)

S. Saraf (Advanced Materials Processing and Analysis Center, University of Central Florida), A. Mesbahi (University of Central Florida), J. Harper (Department of Chemistry, University of Central Florida), and S. Seal (University of Central Florida, Advanced Materials Processing and Analysis Center)