1554
Atomic Layer Deposition of an Ultrathin Al2O3 Layer on TiO2-X Nanorods for Enhanced CO2 Photoreduction with Water

Wednesday, 31 May 2017: 11:30
Grand Salon A - Section 6 (Hilton New Orleans Riverside)
H. Zhao and Y. Li (Texas A&M University)
Anatase TiO2 nanorods (ANR) with active facet {100} as the dominating facet were synthesized and oxygen deficient TiO2-X nanorods (ReANR) was prepared by reducing TiO2 using NaBH4. A thin layer of Al2O3 was coated on the surface of ReANR by atomic layer deposition (ALD), and the thickness of Al2O3 was tailored by varying the cycle number (1, 2, 5, 10, 50, 100, or 200) of ALD operation. The growth rate of Al2O3 was 0.25 Å per cycle as evidenced by high-resolution transmission electron microscopy, and the amorphous structure of Al2O3 was determined based on X-ray diffraction results. ANR, ReANR and Al2O3 coated ReANR were tested for CO2 photoreduction with water, with CO and CH4 as the major and minor products, respectively. Compared with ANR, ReANR had more than 50% higher CO production and more than ten times higher CH4 production due to the oxygen vacancies that possibly promoted CO2 adsorption and activation. With less than 5 cycles of ALD, Al2O3 coated ReANR had enhanced overall production of CO and CH4 than uncoated ReANR, with 2 cycles being the optimum, about 40% higher overall production than ReANR. Whereas, when more than 5 cycles were applied, both CO and CH4 production decreased with increasing number of ALD cycles. Photoluminescence (PL) analysis showed the both 2 cycles and 200 cycles of Al2O3 ALD coating layer on the ReANR were able to reduce the charge carrier recombination rate, likely because of the passivation of surface states. However, a relatively thick layer of Al2O3 may act as an insulation layer to prohibit electron migration to the catalyst surface. This work gives valuable insights on the application of ALD coating on photocatalysts to promote CO2 photoreduction to fuels.