The novel material system Ga(NAsP) can be grown lattice-matched to (001) Si-substrate. The incorporation of N in the Ga(NAsP)-material allows for a significant reduction in the lattice constant, which leads on one side to a dislocation free deposition. On the other side the specific conduction band formation process in these materials is used to realize a direct band gap semiconductor. By applying a variety of physical investigation techniques the high crystalline quality as well as the direct band gap character of the novel Ga(NAsP)-material system have been verified. Ga(NAsP)/(BGa)(AsP)-MQWH were grown on exactly oriented (001) Si substrates embedded in thick (BGa)P separate confinement hetero-layers by metalorganic vapour phase epitaxy (MOVPE). The optoelectronic properties and first lasing characteristics of Ga(NAsP)-MQWH on (001) Si-substrate will be presented and possible integration concepts with Si-CMOS-based micro- and nanoelectronics will be discussed.