Development of modern electrodeposition processes requires better insight into the atomic-scale mechanisms, in particular into the initial stages of nucleation and growth. With state-of-the art synchrotron-based X-ray scattering techniques, detailed structural data can be obtained in operando during deposition. These measurements allow monitoring simultaneously various structural properties, such as the epitaxial relationship, the horizontal and vertical grain size, and the strain, with high temporal and spatial resolution and in parallel with electrochemical and optical data. Moreover, studies of a wide range of electrodeposition processes are feasible. This includes deposition on single crystal electrodes, on technical samples and even at liquid-liquid interfaces – a topic of renewed interest. In this talk, characteristic examples will be given that demonstrate the level of detail, obtainable by such in operando X-ray scattering measurements. In particular, the initial stages of growth from monolayers to thicknesses of several ten nanometers will be discussed.