Electrodeposition of Thin Films - Metals and Metal Oxides

Tuesday, 3 October 2017: 08:00-12:40
Chesapeake H (Gaylord National Resort and Convention Center)
Chairs:
Stanko R Brankovic , Philippe Allongue and Natasa Vasiljevic
08:40
903
09:20
904
Electrodeposition of Metals and Metal Oxides into Nanoporous Gold
A. A. El-Zoka, A. G. Carcea, M. Ghaznavi, and R. C. Newman (University of Toronto)
09:40
Break
10:00
905
(Invited) Characterisation of Metal Deposition and Metal Dissolution Processes in Deep Eutectic Solvents Using Electrochemical, Gravimetric and Neutron Scattering Methods
K. S. Ryder, A. R. Hillman, E. J. R. Palin, H. Al-Esary, R. Sapstead (University of Leicester), J. A. Juma (Koya University, Koya), E. L. Smith (Nottingham Trent University), V. Ferreira (Universidade de Lisboa), N. J. Steinke, R. Dalgliesh (STFC Rutherford Appleton Laboratory), R. Barker (Institut Laue Langevin, University of Dundee), and A. D. Ballantyne (Imperial College, London)
10:40
906
(Invited) Novel in-Situ Operando X-Ray Absorption Spectroscopy Techniques for the Characterization of the Electrochemical Growth of Metal Oxides
F. Di Benedetto (Department of earth sciences - University of Florence), E. Berretti (Department of Chemistry - University of Florence), A. Giaccherini (Department of chemistry - University of Florence), W. Giurlani (Department of Chemistry - University of Florence), M. Innocenti (CNR-ICCOM, Department of Chemistry - University of Florence), A. Lavacchi (CNR-ICCOM), and G. Montegrossi (CNR-IGG)
11:20
907
An Ex-Situ Study of Epitaxial Growth of Nickle on Copper Substrate in Electrodeposition
Y. C. Huang, Y. C. Hou, L. Chang (National Sun Yat-Sen University), and T. Yan (Fujian Institute of Research on the Structure of Matter)
 
908
Electrodeposition of Nickel on Titanium in Aqueous Acidic Electrolytes (Cancelled)
12:00
909
Electrodeposition Though Polyelectrolyte Layers: Control of Interfacial Reaction, Deposition Rate, and Morphology of Deposited Thin Films
K. Akamatsu, R. Fujiwara, Y. Takashima, T. Tsuruoka (FIRST, Konan University), Y. Sato, H. Iisaka, J. Murai, M. Hiraoka, and H. Yanagimoto (Toyota Motor Corporation)
12:20
910
Tuning Electrodeposition Conditions Towards the Formation of Smooth Bi2Se3 Thin Films
P. B. Souza (Universidade Federal de Santa Catarina), M. A. Tumelero (Universidade Federal do Rio Grande do Sul), G. Zangari (University of Virginia), and A. A. Pasa (Universidade Federal de Santa Catarina)