991
Electrodeposition of Nickel Selenide Thin Films

Thursday, 5 October 2017: 10:10
Chesapeake G (Gaylord National Resort and Convention Center)
D. Kutyla, K. Kolczyk, P. Zabinski, and R. Kowalik (AGH University of Science and Technology)
Chalcogenides of transition metals such as zinc, cadmium, cobalt or nickel feature semiconducting properties making them attractive materials for applications in electronics, optics and catalysis. One of the less investigated systems is Ni-Se, although it seems to be very promising material for many purposes. Nickel with selenium can form several selenides of different stoichiometry. NiSe2 can be used as anodic material in modern batteries of high capacity. Moreover NiSe can be successfully applied as a counter-electrode in high energy solar cells. Recently, several works have been devoted to obtain electrocatalytic materials containing nickel with selenium at the same time still featuring comparable properties to noble metal based catalysts.

The article presents results concerning electrochemical deposition of Ni3Se2 from aqueous acidic solutions. The mechanism of electrode reactions in the Ni2+ - H2SeO3 – H2O system was defined with the use of cyclic voltammetry with a gold disk electrode. According to the voltammetry and hydrodynamic methods the process of nickel and selenium co-deposition is determined by the velocity of selenium ions diffusion to the electrode surface. The Ni3Se2 coatings were obtained by the potentiostatic method on copper medium. The elemental composition was determined with the XRF method. The XRD analysis indicated that within potentials from -0.6 to -1.0 V the dominating phase is Ni3Se2. The influence of applied potential and concentration of electroactive species on the elemental and phase composition and the quality of obtained coatings was determined. The surface morphology was observed with the use of scanning electron microscopy.

Acknowledgment
The authors would like to thank Polish National Science Centre for the financial support provided by the grants: No UMO-2016/21/N/ST8/00222, 2011/01/D/ST5/05743, 2016/21/B/ST8/00431 and and the research was carried out in the frames of COST Action MP1407 (e-MINDS).

See more of: Thin Film Structure and Morphology Control
See more of: E05: Mechanics and Metallurgy of Electrodeposited Thin Films
See more of: Electrochemical/Electroless Deposition
<< Previous Abstract | Next Abstract >>