(Invited) Orthogonal E-Beam Lithography Approach on 2D Organic-Inorganic Halide Perovskites

Wednesday, 4 October 2017: 15:30
Chesapeake E (Gaylord National Resort and Convention Center)
C. H. Lin, B. Cheng, T. Y. Li, J. R. Durán Retamal, and J. H. He (King Abdullah University of Science and Technology)
Organic-inorganic halide perovskite-based solar cells are the fastest-advancing photovoltaic technology in nowadays. To further increase optoelectronic applications on perovskite, researchers have devoted great efforts to explore two-dimensional (2D) layered halide perovskites very recently. This novel 2D perovskites can tune their optoelectronic properties by changing the thickness and functional organic group, which is not achievable for 3D perovskites. For 2D materials with ultra-thin thickness (usually less than 10 nm), the E-beam lithography is the most important fabrication process to build the nanostructures on materials to realize the nanodevices. However, the solvents used in current E-beam lithography can strongly destroy the perovskites. In this work, we fabricated the photodetector based on 2D (C6H5C2H4NH3)2PbI4 perovskite with nanoscale Au electrodes by using E-beam lithography process with orthogonal solvents. We show this new lithography method didn’t cause any damage to both optical and electrical properties of 2D perovskite. The I-V characteristics and photoresponse of perovskite photodetector were also measured. We believe this breakthrough will fully activate 2D perovskite for nano-applications.