Atomic Layer Deposition Lithium Fluoride As Coatings for Lithium-Ion Batteries

Tuesday, 3 October 2017: 08:00
Chesapeake L (Gaylord National Resort and Convention Center)
L. Chen, J. W. Elam (Joint Center for Energy Storage Research, Argonne National Laboratory), and J. A. Libera (Argonne National Laboratory)
In this work, atomic layer deposition of lithium fluoride has been studied with in-situ quartz crystal microbalance (QCM), quadrupole mass spectrometer (QMS), and Fourier transform infrared (FTIR) spectroscopy. The LiF ALD film growth was examined at temperatures from 150 to 350 °C. The presursors used in this study reveal self-limiting behaviors. Film thicknesses on silicon substrates were also determined using ex-situ X-ray reflectivity (XRR) and spectroscopic ellipsometry (SE) measurements. Grazing incidence X-ray diffraction (GIXRD) and XRD for thick films both indicate that the ALD LiF as-deposited at 150 °C is crystalline. X-ray photoelectron spectroscopy (XPS) and Rutherford backscattering spectrometry (RBS) measurements demonstrate that the deposited films were nearly stoichiometric LiF with very small amount of hydrogen impurity. The electrochemical meausrements of the ALD LiF coating on both cathodes and anodes for lithium-ion batteries will be presented.