One can obtain Al and Al-Ru films by sputtering or by sintering by powder metallurgy and casting, as well as by electrodeposition. Aqueous solutions cannot be used for electrodeposition of Al, therefore, ionic liquids (ILs) were chosen in this study as electrolytes.
The electrolyte used in our work for deposition of Al consisted of 1:2 molar ratio of 1-ethyl-3-methylimidazolium chloride, [EMIm]Cl, and AlCl3. As an alternative, 1-butyl-1-methylpyrrolidinium bis[(trifluoromethyl)sulfonyl]amide, [BMP][TFSA], has also been investigated. RuCl3 and AlCl3 were two of the sources chosen for Al and Ru. Moreover, Ru particles produced by gas phase electrodeposition, were added to an Al electrolyte. The morphology and the composition of the deposited layers were investigated by SEM/EDX. The effect of the IL and of the precursor for Ru on the growth of the layers and on the properties of the deposited films will also be discussed.