G02 Poster Session

Tuesday, 3 October 2017: 18:00-20:00

Prince George's Exhibit Hall D/E (Gaylord National Resort and Convention Center)

1110

Interface Studies of III-V Semiconductors and Oxides with an In-Situ Spectroscopic Ultra-High Vacuum (UHV) System Capable of Atomic Layer Deposition (ALD) and Atomic Layer Etch (ALEt) (Cancelled)

1111

Synthesis of ALD Iridium Thin Films on Silicon and Monel K-500 Steel Substrates

P. J. Oelslager (Old Dominion University) and H. Baumgart (Applied Research Center)

See more of: G02: Atomic Layer Deposition Applications 13
See more of: Electronic Materials and Processing

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