ALD Metal and Metalfluorides

Tuesday, 3 October 2017: 15:00-17:25
Chesapeake L (Gaylord National Resort and Convention Center)
Chairs:
J. W. Elam and Fred Roozeboom
15:00
1106
(Invited) Atomic Layer Deposition of Cobalt, Nickel, and Iron Sulfides: Synthesis and Applications
X. Wang (School of Adv Mater, Shenzhen Grad School, Peking Univ)
15:40
1107
Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
S. Aussen, A. Hardtdegen, K. Skaja, and S. Hoffmann-Eifert (PGI and JARA-Fit, Forschungszentrum Jülich GmbH, Germany)
16:00
1108
(Invited) Atomic Layer Deposition of Nanoalloys of Noble and Non-Noble Metals
R. K. Ramachandran, J. Dendooven (Department of Solid State Sciences, Ghent University), M. Filez (Utrecht University), V. V. Galvita, H. Poelman, E. Solano (Ghent University), M. M. Minjauw (Department of Solid State Sciences, Ghent University), G. B. Marin (Ghent University), and C. Detavernier (Ghent University, Dept. of Solid-state Sciences)
16:40
1109
(Invited) ALD Metal Fluorides for Ultraviolet Filter and Reflective Coating Applications
J. Hennessy, A. Jewell, and S. Nikzad (Jet Propulsion Laboratory)
17:20
Concluding Remarks
See more of: G02: Atomic Layer Deposition Applications 13
See more of: Electronic Materials and Processing
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