Oral Session 2

Tuesday, 3 October 2017: 14:00-18:20
Chesapeake G (Gaylord National Resort and Convention Center)
Chairs:
Richard Alkire and L. T. Romankiw
14:00
Introductory Remarks
14:40
956
The Study of Complexed Copper(II) Ion and Its Application for Electroless Copper Deposition
H. M. Chang and W. P. Dow (National Chung Hsing University)
15:00
957
Electrodeposition of NiPd Alloy in Alkaline Ni2+ – Pd2+ – Cl– NH3 – H2O System
K. Mech (AGH University of Science and Technology), J. P. Chopart (Université de Reims Champagne-Ardenne), M. Wrobel (AGH University of Sceince and Technology), P. Zabinski, and K. Szacilowski (AGH University of Science and Technology)
15:20
958
Anodic MnO2 deposition on Titanium Electrode Coated with Thermally Prepared Manganese Oxide
Y. Yoshida, K. Kawaguchi, and M. Morimitsu (Doshisha University)
15:40
959
16:00
Break
16:20
960
Electrochemical Atomic Layer Deposition: Self-Terminated Electrodeposition Reactions
T. P. Moffat, Y. Liu, S. H. Ahn, N. L. Ritzert, R. Wang, E. Gillette (NIST), D. Gokcen (National Institute of Standards and Technology), H. Tan (NIST, Gaithersburg, MD, USA), C. Hangarter (U.S. Naval Research Laboratory), L. Bendersky (NIST), U. Bertocci (National Institute of Standards and Technology), and H. You (Argonne National Laboratory)
16:40
961
Control of Magnetism with Electrochemical Potential
P. Allongue (CNRS-Ecole polytechnique), F. Maroun (CNRS-Ecole Polytechnique), A. Lamirand (Diamond Light Source), N. Tournerie (ECAM Rennes), N. Di (CNRS-Ecole Polytechnique), and R. L. Novak (Federal University of Santa Catarina (Brazil))
17:00
962
Fabrication and Preparation of Micro-Coaxial Wires: Electrodeposition of Conductive Shields
S. C. Barron, P. Sricharoenchaikit, D. A. Torres, G. Romano, R. H. Morrison, A. P. Magyar, H. Zhang, and C. L. Gray (Draper Laboratory)
18:00
Concluding Remarks