G01 Poster Session

Tuesday, 15 May 2018: 18:00-20:00
Ballroom 6ABC (Washington State Convention Center)
Chairs:
Fred Roozeboom and Stefan De Gendt
 
1390
Investigating the Elimination of Oxygen Vacancy and Nitrogen Gap in Hafnium Oxide Films Induced By Different Nitridation Process (Cancelled)
 
1391
Enhanced Non-Linearity Factor in Ferroelectric Tunnel Junction Based on HfO2 Heterojunction (Cancelled)
 
1393
Improvement of Line Width Roughness and Line Edge Roughness for Ultrascaled Finfet Technologies (Cancelled)
 
1395
Reliability Characteristics of Low Dielectric Constant Materials Under Mechanical-Electrical Stress (Cancelled)
 
1396
Effect of Copper Diffusion in Low Dielectric Constant Dielectrics Under Thermal Stress on Electrical and Reliability Characteristics (Cancelled)
Plasma-Based Copper Etch Process and Reliability
B. Gao (Texas A&M University), Y. Gao (Ohio University), Y. Kuo (Texas A&M University), and T. Yuan (Ohio University)
Adjustable Silicon Corner Rounding Radius by Wet Technique
P. T. Tou, H. Y. Liao, H. C. Huang, K. Y. Shih, and M. C. Lu (Powerchip Technology Corporation)
 
1399
Novel Method for Metal-Insulator-Metal (MIM) Plasma Etching Residue Removal (Cancelled)