G01 - Wetting and Drying

Tuesday, 15 October 2019: 08:30-10:30
Room 209 (The Hilton Atlanta)
Chairs:
Derek Bassett and Yasutaka Yamaguchi
08:30
(Invited) Molecular Dynamics Analysis on the Behavior of Water-Methanol Liquid Mixture on a Silica Surface
Y. Yamaguchi, K. Oda (Department of Mechanical Engineering, Osaka University), M. Kawakami, and D. Yano (Organo Corporation)
09:10
(Invited) Capillary Pattern Collapse: Prediction and Prevention from Past to Future
D. Bassett (Tokyo Electron America)
09:50
Physical Simulation and Visualization of the Marangoni Convection inside Meniscus Region Under IPA Vapor in Wafer Drying Process
N. Ono, T. Yamada, S. Miura (Shibaura Institute of Technology), T. Ishibashi, H. Matsuo, and K. Watanabe (Ebara corporation)
10:10
A New Approach of Tackling Wafer Contact Mark Contamination Issues in Manrangoni Drying
G. Chen, D. Nemeth, and I. Kashkoush (Naura Akrion Inc)
See more of: G01: 16th International Symposium on Semiconductor Cleaning Science and Technology (SCST 16)
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