G01 - FEOL Digital Session

Tuesday, 31 May 2022: 15:40-17:10
West Meeting Room 113 (Vancouver Convention Center)
Chairs:
Paul Mertens and Koichiro Saga
15:40
1263
(Digital Presentation) High-Dose Ion-Implanted Photoresist Stripping Technology Employing High Temperature Single-Wafer SPM System
K. Sasahira, S. Nakamura, K. Hamada, S. Jinbo (Fine Mechatronics Division, Shibaura Mechatronics Corp.), and K. Hattori (Center for Low-temperature Plasma Sciences, Nagoya Univ.)
16:00
1264
(Digital Presentation) Two-Step Wet Clean for HKMG TiAl Protection and Polymer-Free
T. Chen, W. Tu, and H. Zhang (Semiconductor Manufacturing International Corporation)
16:20
1265
(Digital Presentation) Efficient Mandrel Cleaning Process for Fin-FET Technology Node
J. Zhang (Semiconductor Manufacturing International Corporation)
16:40
1266
(Digital Presentation) Adsorption Characteristics of SiO2/Si, Nanocomposites of Multiwalled Carbon Nanotubes and Polyamide, Polyvinyl Chloride, Polyethylene, Porous Polystyrene
Y. A. Onanko, D. V. Charnyi, A. P. Onanko, O. P. Dmytrenko, M. P. Kulish, T. M. Pinchuk-Rugal, and P. P. Ilyin (Kyiv national university)
17:00
Concluding Remarks
See more of: G01: 17th International Symposium on Semiconductor Cleaning Science and Technology (SCST 17)
See more of: Electronic Materials and Processing
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