G01 - Wetting and Drying

Tuesday, 31 May 2022: 08:00-11:40
West Meeting Room 113 (Vancouver Convention Center)
Chairs:
Tae-Gon Kim and Yasutaka Yamaguchi
08:00
1252
(Invited) Nanoscale Wetting and Its Connection with Macroscopic Young's Equation
Y. Yamaguchi (Osaka University, Tokyo University of Science), H. Kusudo, C. Bistafa (Osaka University), D. Surblys (Tohoku University), T. Omori (Osaka City University), and G. Kikugawa (Tohoku University)
08:40
1253
Effect of pH and Ion Concentration on Wetting of Nanoholes and Water Structuring
H. Cho (Hanyang University), G. Vereecke, K. Kenis (imec), T. G. Kim, J. G. Park (Hanyang University ERICA), K. Wostyn, and E. A. Sanchez (imec)
09:00
1254
Ice-VII-like Structure Observed By XRD in Water Confined in Silica Nanoholes
G. Vereecke, K. Kenis, K. Wostyn, and E. A. Sanchez (imec)
09:20
1255
Hydrophobic Films Surface Preparation And Its Impact on Wet Cleaning
T. Mercadier (STMicroelectronics), P. Garnier (STMicroelectronics SA Crolles 2), V. Loup (CEA Grenoble), R. Tiron, P. Gergaud (CEA Leti), and E. Martinez (CEA)
09:40
Break
10:00
1256
(Invited) Characterization of Wetting Behavior on High Aspect Ratio Multilayer Structure
T. G. Kim (Hanyang University ERICA), D. Kim (Hanyag University ERICA), and J. Park (Hanyang University ERICA)
10:40
1257
Research on Single Wafer RCA Clean in High Aspect Ratio Trenches
F. Chen (Fudan University & ACM Research (Shanghai) Inc), D. W. Zhang (Fudan University), X. Wei, X. Zhang, F. Liu, S. A. Henry, H. Hu (ACM Research (Shanghai) Inc), L. Yao, W. Chen, X. Shou, and Y. Cui (Shanghai Huahong Grace Semiconductor Co. Ltd)
11:00
1258
Extendibility Study of Conventional IPA Drying Process from Dynamic Fluid Model for Pattern Collapse
M. Otsuji, T. Tanaka, A. Iwasaki, H. Takahashi, and Y. Okuno (SCREEN Semiconductor Solutions Co., Ltd.)
See more of: G01: 17th International Symposium on Semiconductor Cleaning Science and Technology (SCST 17)
See more of: Electronic Materials and Processing
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