Sunday, 9 October 2022: 14:40
Room 211 (The Hilton Atlanta)
Advanced materials, often relying on nanostructured particles as building blocks, are crucial in meeting grand challenges in energy: battery materials, electrocatalysts, phase change materials, etc. etc. Gas phase deposition techniques, such as chemical vapour deposition (CVD), atomic layer deposition (ALD), and molecular layer deposition (MLD) are excellent methods to make such nanostructured particles: particles of which the surface is either covered by an ultrathin film or by nanoclusters. When combined with proper particle handling, these coating methods are also very well suitable for scaling up. This requires adequate reactor technology to optimize the contacting of particles and gaseous reactants.
Gas phase coating such as CVD and ALD is already widely applied in the semiconductor industry. Although the underlying mechanisms are similar, there are quite some differences between gas phase deposition on wafers and coating particles. This tutorial will discuss recent developments and insights in the field of applying gas phase deposition to particles, with an emphasis on reactor technology, precursor utilization, operating conditions, and scaling up. I will show that we can produce nanostructured particles with very high precision in a scalable way. I will focus on energy applications, and will discuss how this approach can also be of value in light of the increasing demand for critical raw materials.