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(Invited) Atomic Layer Deposition in Life Science Applications

Monday, 1 October 2018: 15:20
Universal 16 (Expo Center)
G. Sundaram (Veeco-CNT)
The increasing adoption of Atomic Layer Deposition (ALD) to grow thin films that take advantage of its salient properties such as conformality, uniformity, and stoichiometric control, has paved the way for its use in a number of emerging applications. Among these, the area of life sciences can potentially benefit from the use of ALD. In this paper we will examine an in-vitro case study of the use of ALD as a means of enhancing osteoblast functions, and simultaneously inhibiting microbial growth on the in-body implant materials, Ti, and PEEK.