G02 Atomic Layer Deposition Applications 14

Lead Organizer: Fred Roozeboom (Eindhoven University of Technology, TNO-Holst Centre)

Co-organizers: Stefan De Gendt (KU Leuven, imec) , Jolien Dendooven (Department of Solid State Sciences, Ghent University) , Jeffrey W. Elam (Joint Center for Energy Storage Research) , O. van der Straten (IBM) , Chanyuan Liu (Lam Research) and Andrea Illiberi (ASM Europe)

Monday, 1 October 2018

Monday | Tuesday | top

08:00-09:00


Tutorial on Atomic Layer Etching
Universal 16
Chair(s): Fred Roozeboom

09:00-12:00


Area Selective Deposition
Universal 16
Chair(s): Andrea Illiberi and J. W. Elam

12:00-12:40


History of Atomic Layer Deposition
Universal 16
Chair(s): Chanyuan Liu and Fred Roozeboom

14:00-15:20


Atomic Layer Deposition Materials
Universal 16
Chair(s): O. van der Straten and Stefan De Gendt

15:20-16:00


Emerging Atomic Layer Deposition Applications
Universal 16
Chair(s): Jolien Dendooven and O. van der Straten

Tuesday, 2 October 2018

Monday | Tuesday | top

08:20-09:20


Tutorial on Precursor Design for Atomic Layer Processing
Universal 16
Chair(s): Fred Roozeboom

09:20-10:20


Atomic Layer Deposition Precursors
Universal 16
Chair(s): Charles H. Winter and Andrea Illiberi

10:20-12:40


Energy Storage Applications
Universal 16
Chair(s): Anil U. Mane and Jolien Dendooven

14:00-15:20


3D Structured Materials
Universal 16
Chair(s): Riikka L. Puurunen and Chanyuan Liu

15:20-17:40


Atomic Layer Etching
Universal 16
Chair(s): Fred Roozeboom and Stefan De Gendt