AiMES 2018 Meeting (September 30 - October 4, 2018): Tutorial on Precursor Design for Atomic Layer Processing

Tutorial on Precursor Design for Atomic Layer Processing

Tuesday, 2 October 2018: 08:20-09:20

Universal 16 (Expo Center)

Chair:

Fred Roozeboom

08:20

992

(Invited) Atomic Layer Deposition of Tungsten-Rich Tungsten Carbide Films Using WCl₆ and AlH₂(tBuNCH₂CH₂NMe₂) as Precursors

K. J. Blakeney, C. L. Ward, and C. H. Winter (Wayne State University)

See more of: G02: Atomic Layer Deposition Applications 14
See more of: Electronic Materials and Processing

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