Atomic Layer Etching

Tuesday, 2 October 2018: 15:20-17:40
Universal 16 (Expo Center)
Chairs:
Fred Roozeboom and Stefan De Gendt
15:20
1002
(Invited) Atomic Layer Processing from an Etching Perspective
T. Lill, I. Berry, A. Fischer, M. Shen, and V. Vahedi (Lam Research)
16:00
Break
16:20
1003
(Invited) Layer Control of 2D-MoS2 by Atomic Layer Etching and Its Device Characteristics
K. S. Kim (Advanced Materials Sci and Eng. Sungkyunkwan Univ), K. H. Kim (Advanced Materials Sci. and Eng, Sungkyunkwan Univ.), Y. J. Ji (Advanced Materials Sci and Eng, Sungkyunkwan Univ), and G. Y. Yeom (Advanced Materials Sci. and Eng., SungKyunKwan Univ,, SKKU Advanced Institute of Nano Technology, SKKU)
17:00
1004
(Invited) Atomic Layer Deposition and Etching of 2D Transition Metal Dichalcogenide Materials
A. U. Mane, D. Choudhury, S. Letourneau, and J. W. Elam (Argonne National Laboratory)
See more of: G02: Atomic Layer Deposition Applications 14
See more of: Electronic Materials and Processing
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