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(Electronics & Photonics Division Award Presentation) Si-SiO2 Interface to High-K-Ge/III-V Interface: Passivation and Reliability
(Electronics & Photonics Division Award Presentation) Si-SiO2 Interface to High-K-Ge/III-V Interface: Passivation and Reliability
Monday, May 13, 2013: 14:00
Norfolk, Mezzanine Level (Sheraton)
Abstract:
- E5-0855 (669.3KB) - Abstract Text