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(Invited) Metal Gate/High-κ Dielectric Gate Stack Reliability; or How I Learned to Live with Trappy Oxides

Tuesday, May 14, 2013: 14:00
Norfolk, Mezzanine Level (Sheraton)
Barry P. Linder, Ph.D. , IBM Corporation, Yorktown Heights, NY
Eduard A. Cartier , IBM T.J. Watson Research Center
Siddarth Krishnan , IBM Corporation

Abstract:

See more of: Si Channel: Gate Stack Reliability
See more of: E5: Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 3
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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