2100
Numerical Calculation Model of Single Wafer Wet Etcher Using Swinging Nozzle

Monday, October 28, 2013: 14:00
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Hitoshi Habuka, Dr. , Yokohama National University, Yokohama, Japan
Shintaro Ohashi, Mr. , Yokohama National University
Kosuke Mizuno, Mr. , Yokohama national University
Tetsuo Kinoshita, Mr. , Pre-Tech

Abstract:

  • E8-2100 (286.0KB) - Abstract Text
See more of: Wet Etching and Cleaning
See more of: E8: Semiconductor Cleaning Science and Technology 13 (SCST 13)
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
Previous Abstract | Next Abstract >>