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Contamination Control in Supercritical CO2 Drying Process for Nano-Scale Memory Manufacturing

Tuesday, October 29, 2013: 15:20
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Hidekazu Hayashi , Yokkaichi, Toshiba Corporation, Mie, Japan
Hisashi Okuchi , Toshiba Corporation
Hiroshi Tomita , Toshiba Corporation
Yoshinori Ono , Organo Corporation
Tadashi Nakamori , Organo Corporation
Hiroshi Sugawara , Organo Corporation

Abstract:

See more of: Wafer Drying and Wetting Issues
See more of: E8: Semiconductor Cleaning Science and Technology 13 (SCST 13)
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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