2122
Effects of Plasma and Wet Processes on Si-Rich Anti-Reflective Coating to Address Selective Trilayer Rework for Sub-20nm Technology Nodes

Tuesday, October 29, 2013: 17:00
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Olivier Pollet , CEA-LETI, Grenoble, France
Romain Sommer , CEA-LETI
Laurent Lachal , CEA-LETI
Sebastien Barnola , CEA-LETI
Come De Buttet , CEA-LETI
Claire Richard , ST Microelectronics
Cecile Jenny , ST Microelectronics

Abstract:

  • E8-2122 (2260.0KB) - Abstract Text
See more of: Photeresist Removal and Related Topics
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