2121
Cryogenic Single-Component Micro-Nano Solid Nitrogen Particle Production Using Laval Nozzle for Physical Resist Removal-Cleaning Process

Tuesday, October 29, 2013: 16:40
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Jun Ishimoto, Ph.D , Institute of Fluid Science, Tohoku University, Sendai, Japan
U Oh, MS , Hitachi, Ltd.
Tomoki Koike , Graduate School of Engineering, Tohoku University
Naoya Ochiai, Ph.D , Institute of Fluid Science, Tohoku University, Sendai, Japan

Abstract:

  • E8-2121 (204.6KB) - Abstract Text
See more of: Photeresist Removal and Related Topics
See more of: E8: Semiconductor Cleaning Science and Technology 13 (SCST 13)
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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